air permitting - semiconductor research facility

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Project Description

CEI reviewed and evaluated emissions for projected chemical usage for a NH research facility that was trying various formulations to produce advanced semiconductor device technology for next generation communication devices.  Since it was a new facility, much of the chemical usage was estimated. Through anonymous communications with DES, CEI was able to find an area in the regulations that would allow for the company to operate without a permit while collecting more information on actual chemical use. Chemical usage changed significantly from what was anticipated with the more problematic toxics, in terms of meeting State AALs, being eliminated from the facility, and much smaller quantities being used for the remainder chemicals. CEI calculated emission based on vapor pressures, chemical bath times, temperatures and hooded fan exhaust flow rates. These were modeled with an air dispersion model in accordance with DES policy with and without the treatment scrubber in place. It was determined that a permit was not needed, and the appropriate modeling documentation was submitted to DES for review and approval. DES submitted a letter agreeing that no permit was necessary.